| 摘要 |
<P>PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. <P>SOLUTION: The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the substrate table, or (iii) a surface of the shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap. <P>COPYRIGHT: (C)2010,JPO&INPIT |
