发明名称 HEAT GENERATION ANALYSIS METHOD OF SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To overcome the problem that a faulty point analysis method of a semiconductor element is inaccurate and impossible to be effectively utilized although the faulty point analysis method of the semiconductor element is a heat generation analysis method, a hot electron luminescence analysis method, a liquid crystal method and an IR-OBIRCH method, and the liquid method is known as a method for identifying a faulty point under a metal layer by heat generation. SOLUTION: While a voltage having a waveform in a pulsating flow state is applied, the semiconductor element is operated, and a heat generation analyzer detects heat generated by a current flowing in the semiconductor element. The faulty point is identified by an infrared image of the semiconductor element after the heat is generated. Since the voltage has the waveform in the pulsating flow state, the heat can be intermittently generated, and a specific region in which the heat is generated can be identified as a pinpoint. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009288090(A) 申请公布日期 2009.12.10
申请号 JP20080141204 申请日期 2008.05.29
申请人 SANYO ELECTRIC CO LTD;SANYO SEMICONDUCTOR CO LTD 发明人 KANEKO MAMORU
分类号 G01R31/26 主分类号 G01R31/26
代理机构 代理人
主权项
地址