| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a pattern which can form a fine and high-density pattern with a high precision. Ž<P>SOLUTION: The method for forming a pattern comprising applying a first liquid containing nanoparticles onto a target by a liquid coating device to form a functional film pattern draws an evaporation control pattern 21 suppressing the evaporation of a fluid component from the line group 200 with a second liquid at a position outside a line 201 at least to be drawn first, prior to the drawing of a line group 200 of a coating film which turns to a functional film pattern. Providing the evaporation control pattern 21 makes it possible to uniformize the evaporating gas concentration of a functional film pattern area and to keep drying conditions constant. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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