发明名称 ATMOSPHERIC PRESSURE PLASMA GENERATING DEVICE AND ATMOSPHERIC PRESSURE PLASMA DEVICE FOR TREATING THE SURFACE HAVING THE SAME
摘要 PURPOSE: An atmospheric pressure plasma generating apparatus and an atmospheric pressure plasma surface treatment apparatus comprising the same are provided to perform stable and uniform plasma surface treatment, by injecting a plasma gas between a first injection hole and a second injection hole through a number of injection through-holes. CONSTITUTION: A power source electrode(110) has a bottom of flat semicircular shape or elliptic profile shape. A first ground electrode(120) generates plasma in a space separated from the power source electrode by reacting to the power supply electrode. A second ground electrode(130) generates plasma in a space separated from the power source electrode by reacting to the power source electrode. A gas feed port(140) supplies a reaction gas to a space separated between the power source electrode and the second ground electrode. A first injection hole(151) is located in one end of the power source electrode. A second injection hole(152) is located in the other end of the power source electrode.
申请公布号 KR20090125471(A) 申请公布日期 2009.12.07
申请号 KR20080051597 申请日期 2008.06.02
申请人 K.C.TECH CO., LTD. 发明人 JUNG, CHUNG HWAN;LEE, KEUN WOO;SHIN, IN CHUL
分类号 H01L21/3065 主分类号 H01L21/3065
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