发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which retains high transmittance, has high sensitivity, substantially avoids a change in pattern shape and the like due to difference in post-bake temperature over a wide temperature range, and also excels in storage stability, and to provide a cured film which is obtained from the composition. <P>SOLUTION: The positive photosensitive resin composition comprises (A) an alkali-soluble acrylic polymer, having an aliphatic hydroxyl group in a side chain, (B) a 1,2-quinonediazide compound, (C) a compound which generates sulfonic acid under heat and (D) a solvent. The cured film obtained using the composition and a liquid crystal display element containing the cured film are also provided. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009282312(A) 申请公布日期 2009.12.03
申请号 JP20080134462 申请日期 2008.05.22
申请人 NISSAN CHEM IND LTD 发明人 HATANAKA MAKOTO;SAKAGUCHI TAKAHIRO
分类号 G03F7/004;G02F1/13;G02F1/1333;G03F7/023;G03F7/40;H01L21/027 主分类号 G03F7/004
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