发明名称 METHOD OF GROWING NITRIDE SINGLE CRYSTAL AND METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 There is provided a method of growing a nitride single crystal. A method of growing a nitride single crystal according to an aspect of the invention may include: growing a first nitride single crystal layer on a substrate; forming a dielectric pattern having an open area on the first nitride single crystal layer, the open area exposing a part of an upper surface of the first nitride single crystal layer; and growing a second nitride single crystal layer on the first nitride single crystal layer through the open area while the second nitride single crystal layer grows to be equal to or larger than a height of the dielectric pattern, wherein the height of the dielectric pattern is greater than a width of the open area so that dislocations in the second nitride single crystal layer move laterally, collide with side walls of the dielectric pattern, and are terminated.
申请公布号 US2009298214(A1) 申请公布日期 2009.12.03
申请号 US20080263873 申请日期 2008.11.03
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PAEK HO SUN;LEE SUNG NAM;LEE JEONG WOOK;JUNG IL HYUNG;SUNG YOUN JOON
分类号 C30B29/38;H01L21/205;H01L33/16;H01L33/32;H01S5/323 主分类号 C30B29/38
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