发明名称 DEFECT OBSERVATION METHOD AND DEFECT OBSERVATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To collect defect images steadily and at high throughput, in a method of observing defects on multiple samples in a short period of time by using a defect observation device. <P>SOLUTION: This defect observation device is structured such that a defect detection method is selected before imaging and set up for each of observation target defects on the samples based on the external characteristics of the samples that are calculated from the design information about the samples; and the defect images are collected after an imaging sequence is set up for the defect images and reference images to reduce the time required for stage movement based on the defect coordinates on the samples and the set defect detection method. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009283917(A) 申请公布日期 2009.12.03
申请号 JP20090098812 申请日期 2009.04.15
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HARADA MINORU;NAKAGAKI AKIRA;OBARA KENJI;MIYAMOTO ATSUSHI
分类号 H01L21/66;G01N23/225 主分类号 H01L21/66
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