发明名称
摘要 <p>The invention relates to a method for producing a matrix of electronic components, comprising a step of producing an active layer on a substrate, and a step of individualizing the components by forming trenches in the active layer at least until the substrate emerges. The method comprises steps of depositing a layer of functional material on the active layer, depositing a photosensitive resin on the layer of material in such a way as to fill said trenches and to form a thin film on the upper face of the components, at least partially exposing the resin to radiation while underexposing the portion of resin in the trenches, developing the resin in such a way as to remove the properly exposed portion thereof, removing the functional material layer portion that shows through after the development step, and removing the remaining portion of resin.</p>
申请公布号 JP2009543367(A) 申请公布日期 2009.12.03
申请号 JP20090518933 申请日期 2007.07.09
申请人 发明人
分类号 H01L21/764;H01L21/3205;H01L21/331;H01L21/76;H01L21/8222;H01L23/52;H01L27/082;H01L27/14;H01L27/146;H01L29/41;H01L29/73;H01L31/10;H01L33/62;H01S5/022 主分类号 H01L21/764
代理机构 代理人
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