| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of improving the throughput. <P>SOLUTION: The exposure apparatus is provided with: an exposure station having a first region including a first position that is irradiated with an exposure light; a measurement station, including a second position for measuring the positional information of a substrate and having a second region different from the first region; a moving body that is movable, while holding the substrate in a predetermined region including the first region and the second region; and an encoder system for measuring the positional information of the moving body. The encoder system has an encoder head, arranged in the moving body and a scale plate that is arranged at a position that can be made to face the encoder head of the moving body, arranged in the exposure station and the encoder head of the moving body arranged in the measurement station, respectively. <P>COPYRIGHT: (C)2010,JPO&INPIT |
