发明名称 |
Apparatus for filtration and gas-vapor mixing in thin film deposition |
摘要 |
An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication. |
申请公布号 |
US2009293807(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20090471831 |
申请日期 |
2009.05.26 |
申请人 |
MSP CORPORATION |
发明人 |
LIU BENJAMIN Y.H.;MA YAMIN;DINH THUC |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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