发明名称 ACTIVE MATRIX SUBSTRATE
摘要 <p>In an active-matrix substrate (100) according to the present invention, a semiconductor layer (110) has a first gettering region (112) adjacent to the source region (132) of a first thin-film transistor (130), a second gettering region (114) adjacent to the drain region (146) of a second thin-film transistor (140), and a third gettering region (116) adjacent to any of the source and drain regions located between the respective channel regions (134 and 144) of the first and second thin-film transistors (130 and 140) among the source and drain regions of the thin-film transistors included in the thin-film transistor element (120).</p>
申请公布号 EP2128898(A1) 申请公布日期 2009.12.02
申请号 EP20080721110 申请日期 2008.02.29
申请人 SHARP KABUSHIKI KAISHA 发明人 MORIYA, YOSHIMIZU;NAKAJIMA, MUTSUMI;KAISE, YASUYOSHI;KITA, MAKOTO;MATSUKIZONO, HIROSHI;ITOH, YOSHIYUKI
分类号 H01L21/336;G02F1/1368;G09F9/30;H01L21/20;H01L21/322;H01L29/786 主分类号 H01L21/336
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