发明名称 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
摘要 A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.
申请公布号 NL2002925(A1) 申请公布日期 2009.12.01
申请号 NL20092002925 申请日期 2009.05.26
申请人 ASML NETHERLANDS B.V. 发明人 OLAV SEIJGER;MARTINUS KOK;SANDER KERSSEMAKERS;MARK MAGIELSEN
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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