发明名称 LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a device useful as an improved spectrum impurity filter. <P>SOLUTION: A zone plate includes a plurality of first and second regions which are adjacently and alternately arranged continuously. The first region is structured to be substantially transmissive on a first predetermined radiation wavelength and a second predetermined radiation wavelength different from the first predetermined radiation wavelength. The second region is structured to be substantially non-transmissive, diffractive, or reflective on the first predetermined radiation wavelength, and is substantially transmissive on the second predetermined radiation wavelength. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009278090(A) 申请公布日期 2009.11.26
申请号 JP20090114454 申请日期 2009.05.11
申请人 ASML NETHERLANDS BV 发明人 SOER WOUTER ANTHON;WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES
分类号 H01L21/027;G02B3/08;G02B5/00;G03F7/20 主分类号 H01L21/027
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