发明名称 SUBSTRATE SURFACE STRUCTURES AND PROCESSES FOR FORMING THE SAME
摘要 Structures and methods are provided for forming substrates having surface coatings thereon. In one aspect, a structure is provided including a substrate, a surface coating formed on the surface of the substrate, wherein the surface coating comprises a monolayer of dielectric particles, and a dielectric layer having a thickness of less than a height of the dielectric particles. In another aspect of the invention, a method is provided for processing a substrate including providing a substrate having a surface, exposing a solution comprising dielectric particles to the substrate surface, forming a monolayer of dielectric particles from the solution on the substrate surface, depositing a dielectric layer on the substrate surface at a thickness of less than the height of the dielectric particles, and exposing the substrate to a thermal process.
申请公布号 WO2008141158(A3) 申请公布日期 2009.11.26
申请号 WO2008US63218 申请日期 2008.05.09
申请人 BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM;ZHOU, WEIDONG;TAO, MENG 发明人 ZHOU, WEIDONG;TAO, MENG
分类号 H01L31/0236 主分类号 H01L31/0236
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