发明名称 MANUFACTURING METHOD OF NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a nitride semiconductor light emitting element having improved light extraction efficiency by improving planarity of an interface between a p-type nitride semiconductor layer and a p-side electrode. <P>SOLUTION: In this manufacturing method of the nitride semiconductor light emitting element, at least an n-type nitride semiconductor layer 102, an active layer 103 and the p-type nitride semiconductor layer 104 are grown in this order over a substrate 101. The manufacturing method includes a process for making a surfactant material contact to the surface of the p-type nitride semiconductor layer before the p-side electrode 105 is grown, or contact to the surface of the p-side electrode in the middle of growing the p-side electrode. It is desirable that a surface energy of the surfactant material is smaller than that of the p-type nitride semiconductor layer and/or p-type electrode. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009277931(A) 申请公布日期 2009.11.26
申请号 JP20080128499 申请日期 2008.05.15
申请人 SHARP CORP 发明人 TAKAOKA HIROKI;FUDETA MAYUKO;KOMADA SATOSHI
分类号 H01L33/06;H01L33/32;H01L33/36;H01L33/40 主分类号 H01L33/06
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