| 摘要 |
<p>PURPOSE: An exposure apparatus and an exposure method of a semiconductor device are provided to apply a plurality of dipole illumination systems through one reticle, in which plural rectangular dots are arranged, by performing the exposure process using a dipole X illumination system and a dipole Y illumination system. CONSTITUTION: An exposure apparatus includes a dipole illumination system, a lens, and a reticle. The dipole illumination system receives light and passes only light of one direction. The lens controls the focus of the light passing through the dipole illumination system. The reticle receives the light passing through the lens and irradiates it on a wafer in a pattern shape. The reticle is formed according as a plurality of dots of the pattern shape are arranged.</p> |
