发明名称 Gate valve and vacuum container for semiconductor processing system
摘要 A gate valve (20) for a semiconductor processing system includes a housing (21) forming a plurality of passages (22A to 22D) arrayed in a first direction. The passages respectively have ports (23A to 23D) facing a first predetermined side in a second direction perpendicular to the first direction. The ports are respectively provided with valve seats (25A to 25D) at gradually set back positions in the second direction, as being closer to a second predetermined side in the first direction. Valve plates (24A to 24D) are arrayed in the second direction to open/close the ports. The valve plates are slid by an actuating mechanism (30A to 30D).
申请公布号 US7622008(B2) 申请公布日期 2009.11.24
申请号 US20050548446 申请日期 2005.09.09
申请人 TOKYO ELECTRON LIMITED 发明人 HIROKI TSUTOMU
分类号 B65G49/00;C23C16/00;B01J3/00;B01J3/02;C23F1/00;F16K3/02;F16K51/02;H01L21/00;H01L21/02;H01L21/677 主分类号 B65G49/00
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