发明名称 VERTICAL HEAT TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vertical heat treatment apparatus which minimizes thermal deformation of a reaction tube caused by annealing, and to prevent occurrence of haze on the surface of a wafer by leakage. SOLUTION: A vertical heat treatment apparatus includes at least a reaction tube made of quartz, a boat for heat treatment which is arranged in the reaction tube in order to hold a substrate to be treated, and a heater for heating the substrate to be treated, wherein the reaction tube includes a tubular body portion and a ceiling portion, and a support for supporting the reaction tube and limiting thermal deformation thereof is arranged on the inside of the reaction tube. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009272332(A) 申请公布日期 2009.11.19
申请号 JP20080118977 申请日期 2008.04.30
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 KOBAYASHI TAKESHI
分类号 H01L21/22;H01L21/31;H01L21/324 主分类号 H01L21/22
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