| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a calculating method for overlap misalignment for deciding the optimum focal position comprehensively by also taking into consideration an index related to precision in measuring overlapping other than an average value of TIS. <P>SOLUTION: In this calculating method for overlap misalignment, the focal position deciding value is defined as follows: (a focal position deciding value)= - (correlation coefficient) + (unevenness in TIS within a substrate surface) + (repetitive measurement reproducibility), by taking into consideration the correlation coefficient of overlap misalignment, 3σ of TIS within the substrate surface, and the repetitive measurement reproducibility. The focal position deciding value is used as the optimum focal position deciding index of an optical microscope for measurement mark. The focal position where the focal position deciding value becomes the minimum value is decided as the optimum focal position, and the average value of TIS within the substrate surface at the optimum focal position is corrected for individual overlap misalignment. <P>COPYRIGHT: (C)2010,JPO&INPIT |
