发明名称 FORMING METHOD OF PROTECTIVE LAYER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of efficiently manufacturing a protective layer with an excellent optical property in producing one by in-line consecutive conveying deposition. Ž<P>SOLUTION: In the forming method of the protective layer by utilizing a consecutive conveying plasma CVD method including a process in which material gas is discharged from a shower cathode, a process in which plasma discharge is generated on the shower cathode, and a process in which a base board of an organic EL element is allowed to move from an upper part of a base board carry-in side edge part of the shower cathode to an upper part of a base board carry-out side edge part of the shower cathode via an upper part of a central part of the shower cathode, only gas not including silicon atoms is discharged to the base board carry-in side edge part of the shower cathode, gas including silicon atoms and gas not including silicon atoms are discharged to the central part of the shower cathode, and only gas not including silicon atoms is discharged to the base board carry-out edge part. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009272042(A) 申请公布日期 2009.11.19
申请号 JP20080118575 申请日期 2008.04.30
申请人 CANON INC 发明人 MATSUDA KOICHI
分类号 H05B33/10;H01L51/50;H05B33/04 主分类号 H05B33/10
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