发明名称 HEATING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a heating device capable of efficiently heating a film on a glass substrate. Ž<P>SOLUTION: A stagnation layer cannot be formed when high-temperature gas is throttled in a beam shape and is allowed to go into a substrate vertically, or temperature of gas can be conducted to the substrate efficiently because of its thinness. In other words, the temperature of the substrate is satisfactorily conducted to the vertically impinging high-temperature gas. The gas heating device can heat gas quickly and efficiently using the principle. On a surface 25 of the glass substrate 24 placed on a support 26, a single high-temperature gas beam having temperature higher than the softening point temperature of the glass substrate is sprayed vertically for heating to high temperature. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009272603(A) 申请公布日期 2009.11.19
申请号 JP20080282947 申请日期 2008.11.04
申请人 PHILTECH INC 发明人 FURUMURA YUJI;NISHIHARA SHINJI;MURA NAOMI
分类号 H01L21/205;C23C16/46;H01L21/20;H01L21/31 主分类号 H01L21/205
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