| 摘要 |
<p>PURPOSE: A method for peeling pellicle is provided to easily peel the completed pellicle from an exposure disc and to have no recontamination by residues of adhesive on an exposure plate after peeling. CONSTITUTION: A method for peeling pellicle for lithography from an exposure plate(5) comprises a step of irradiating UV rays to an adhesive layer(4). The pellicle is obtained by installing a pellicle membrane(1) at one side of a pellicle frame(3) through a pellicle membrane adhesive and forming an exposure plate adhesive layer at the other side. A peeling device comprises a light source, and a unit for heating an exposure disc and pellicle frame.</p> |
