发明名称 AND TYPE FLASH MEMORY ARRAY HAVING VERTICALLY STACKED STRUCTURE AND MANUFACTURING METHOD AND OPERATING METHOD OF THE SAME
摘要 <p>PURPOSE: An AND type flash memory array of a vertical laminate structure, a manufacturing method thereof, and an operating method are provided to perform high integration by forming a local bit line and a local source line in a silicon pin of each layer. CONSTITUTION: An AND type flash memory array of a vertical laminate structure includes one or more bit lines, a local bit line, a memory cell, a local source line, a common source line, a drain selecting line, a source selecting line, and word lines. The local bit line is connected to each bit line(98a,98b,98c) by a first selecting transistor. A plurality of memory cells are parallel connected by using the local bit line as a common drain line. The local source line is commonly connected to a source of each memory cell. The common source line is vertically arranged with each bit line in which the local source line is connected by a second selecting transistor. The drain selecting line and the source selecting line are connected to a gate of the first selecting transistor and a gate of the second selecting transistor. The word lines are connected to a gate of each memory cell.</p>
申请公布号 KR20090118299(A) 申请公布日期 2009.11.18
申请号 KR20080044005 申请日期 2008.05.13
申请人 SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION 发明人 PARK, BYUNG GOOK;PARK, IL HAN;SHIM, WON BO
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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