发明名称 |
RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING(HIPIMS) |
摘要 |
An apparatus for generating sputtering of a target to produce a coating on a substrate with a current density on a cathode of a magnetron between 0.1 and 10 A/cm2 is provided. The apparatus comprises a power supply that is operably connected to the magnetron and at least one capacitor is operably connected to the power supply. A first switch is also provided. The first switch operably connects the power supply to the magnetron to charge the magnetron and the first switch is configured to charge the magnetron according to a first pulse. An electrical bias device is operably connected to the substrate and configured to apply a substrate bias. |
申请公布号 |
KR20090118912(A) |
申请公布日期 |
2009.11.18 |
申请号 |
KR20097014510 |
申请日期 |
2007.12.12 |
申请人 |
OC OERLIKON BALZERS AG |
发明人 |
WEICHART JURGEN;KADLEC STANISLAV |
分类号 |
H01L21/203;C23C14/35 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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