ORGANICALLY MODIFIED, STABLE IN STORAGE, UV CURABLE, NIR PERMEABLE SILICIC ACID POLYCONDENSATES WHICH ARE PHOTOSTRUCTURABLE IN LAYERS OFA THICKNESS OF 1 TO 150 .MU.M, PRODUCTION AND USE THEREOF

摘要

The invention relates to organically modified, stable in storage, UV curable , NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 .mu.m. The invention also relates to the production an d use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2 (I) RSi(OR')3 (II) The radicals are identical or different and have the following meaning: Ar = a radical having 6 to 20 carbon atoms and at least one aromatic group , R = an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C=C double bond, R' = methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1 : 1. Up to 90 mole percent of said compound of the formula II ca n be replaced by co-condensable compounds of boron, aluminum, silicon, germanium, titanium and zirconium.