发明名称 |
Semiconductor device structures for bipolar junction transistors and methods of fabricating such structures |
摘要 |
Semiconductor device structures for use with bipolar junction transistors and methods of fabricating such semiconductor device structures. The semiconductor device structure comprises a semiconductor body having a top surface and sidewalls extending from the top surface to an insulating layer, a first region including a first semiconductor material with a first conductivity type, and a second region including a second semiconductor material with a second conductivity type. The first and second regions each extend across the top surface and the sidewalls of the semiconductor body. The device structure further comprises a junction defined between the first and second regions and extending across the top surface and the sidewalls of the semiconductor body.
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申请公布号 |
US7618872(B2) |
申请公布日期 |
2009.11.17 |
申请号 |
US20080125342 |
申请日期 |
2008.05.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHENG KANGGUO;HSU LOUIS LU-CHEN;MANDELMAN JACK ALLAN |
分类号 |
H01L21/331 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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