发明名称 Semiconductor device structures for bipolar junction transistors and methods of fabricating such structures
摘要 Semiconductor device structures for use with bipolar junction transistors and methods of fabricating such semiconductor device structures. The semiconductor device structure comprises a semiconductor body having a top surface and sidewalls extending from the top surface to an insulating layer, a first region including a first semiconductor material with a first conductivity type, and a second region including a second semiconductor material with a second conductivity type. The first and second regions each extend across the top surface and the sidewalls of the semiconductor body. The device structure further comprises a junction defined between the first and second regions and extending across the top surface and the sidewalls of the semiconductor body.
申请公布号 US7618872(B2) 申请公布日期 2009.11.17
申请号 US20080125342 申请日期 2008.05.22
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHENG KANGGUO;HSU LOUIS LU-CHEN;MANDELMAN JACK ALLAN
分类号 H01L21/331 主分类号 H01L21/331
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