发明名称 INTERMETALLIC COMPOUND FILLED VIAS
摘要 Electronic devices including intermetallic columns within vias are provided. Vias are filled with one or more pastes containing metal particles. Thermal treatment of the pastes within the vias converts the particles within the pastes to one or more intermetallic compounds that do not melt during next level packaging.
申请公布号 US2016218056(A1) 申请公布日期 2016.07.28
申请号 US201615089572 申请日期 2016.04.03
申请人 International Business Machines Corporation 发明人 Lu Minhua;Nah Jae-Woong
分类号 H01L23/498 主分类号 H01L23/498
代理机构 代理人
主权项 1. An electronic device comprising: a wafer; a plurality of vias within the wafer, and a plurality of electrically conductive columns filling the vias, each of the columns consisting essentially of one or more intermetallic compounds, the intermetallic compounds comprising at least one of tin and indium.
地址 Armonk NY US