发明名称 |
INTERMETALLIC COMPOUND FILLED VIAS |
摘要 |
Electronic devices including intermetallic columns within vias are provided. Vias are filled with one or more pastes containing metal particles. Thermal treatment of the pastes within the vias converts the particles within the pastes to one or more intermetallic compounds that do not melt during next level packaging. |
申请公布号 |
US2016218056(A1) |
申请公布日期 |
2016.07.28 |
申请号 |
US201615089572 |
申请日期 |
2016.04.03 |
申请人 |
International Business Machines Corporation |
发明人 |
Lu Minhua;Nah Jae-Woong |
分类号 |
H01L23/498 |
主分类号 |
H01L23/498 |
代理机构 |
|
代理人 |
|
主权项 |
1. An electronic device comprising:
a wafer; a plurality of vias within the wafer, and a plurality of electrically conductive columns filling the vias, each of the columns consisting essentially of one or more intermetallic compounds, the intermetallic compounds comprising at least one of tin and indium. |
地址 |
Armonk NY US |