发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 PURPOSE: A semiconductor device and a manufacturing method thereof are provided to reduce a manufacturing cost using a peripheral semiconductor pattern made of the same material as a cell semiconductor pattern with a memory cell array as a resistor. CONSTITUTION: A semiconductor substrate(100) includes a cell array region and a peripheral circuit region. A first cell gate pattern(120S,120W,120G) are arranged in the cell array region(C). A peripheral gate pattern(120P) is arranged in a peripheral circuit region(P). The cell semiconductor layer is stacked on the semiconductor substrate in the cell array region. A second cell gate pattern is arranged on the cell semiconductor layer. The resistor device with the same level as the cell semiconductor layer is stacked on the semiconductor substrate in the peripheral circuit region.
申请公布号 KR20090117105(A) 申请公布日期 2009.11.12
申请号 KR20080043007 申请日期 2008.05.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, HOO SUNG;KIM, KYOUNG HOON;JU, NOK HYUN
分类号 H01L27/04 主分类号 H01L27/04
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