发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR SINGLE CRYSTAL BY CZOCHRALSKI TECHNOLOGY |
摘要 |
PURPOSE: A method of manufacturing a semiconductor single crystal by a czochralski technology is provide to productivity of a single crystal by increasing a process margin and puling speed of flawless. CONSTITUTION: A crucible housing(20) supports an outer circumference of a crucible(10) as a specific form. A crucible rotating unit(30) rotates a crucible along with the crucible housing. A heating portion(40) is spaced from the side wall of the crucible housing by a predetermined interval and heats the crucible. An insulation part(50) prevents the leakage of heat generated from the heating portion to the outside. A crystal pulling part(60) pulls the single crystal from a silicon solution accommodated into the crucible. A heat shield part(70) reflects the heat emitted from a single crystal.
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申请公布号 |
KR20090116891(A) |
申请公布日期 |
2009.11.12 |
申请号 |
KR20080042693 |
申请日期 |
2008.05.08 |
申请人 |
SILTRON INC. |
发明人 |
JUNG YO HAN;KIM, DO YEON;LEE, HONG WOO;SIM, BOK CHEOL;KANG, KWANG ROUL |
分类号 |
C30B15/00;C30B15/20;C30B30/04 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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