发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR SINGLE CRYSTAL BY CZOCHRALSKI TECHNOLOGY
摘要 PURPOSE: A method of manufacturing a semiconductor single crystal by a czochralski technology is provide to productivity of a single crystal by increasing a process margin and puling speed of flawless. CONSTITUTION: A crucible housing(20) supports an outer circumference of a crucible(10) as a specific form. A crucible rotating unit(30) rotates a crucible along with the crucible housing. A heating portion(40) is spaced from the side wall of the crucible housing by a predetermined interval and heats the crucible. An insulation part(50) prevents the leakage of heat generated from the heating portion to the outside. A crystal pulling part(60) pulls the single crystal from a silicon solution accommodated into the crucible. A heat shield part(70) reflects the heat emitted from a single crystal.
申请公布号 KR20090116891(A) 申请公布日期 2009.11.12
申请号 KR20080042693 申请日期 2008.05.08
申请人 SILTRON INC. 发明人 JUNG YO HAN;KIM, DO YEON;LEE, HONG WOO;SIM, BOK CHEOL;KANG, KWANG ROUL
分类号 C30B15/00;C30B15/20;C30B30/04 主分类号 C30B15/00
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