| 摘要 |
Substrates (transparent electrodes) for thin film solar cells produced by conventional thermal CVD methods or MOCVD methods have problems such as high cost and poor electrical and optical performance. Disclosed are novel method and apparatus using high-frequency plasma CVD, which enable formation of a large film having good electrical and optical properties, while using a low-cost organic metal material as a starting material. A low-cost, highly conductive, highly light-transmitting substrate for thin film solar cells, which has light trapping effect (a projected and recessed structure), can be obtained by forming a transparent electrode film having a two-layer structure composed of a crystalline titanium oxide film and a crystalline zinc oxide film on a transparent insulating substrate by a high-frequency plasma CVD apparatus using an organic metal material as a starting material. Incidentally, a sputtering apparatus can be used for producing the crystalline zinc oxide film.
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