发明名称 AN ARRANGEMENT
摘要 The invention relates in general level to radiation transference techniques as applied for utilisation of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.
申请公布号 KR20090116740(A) 申请公布日期 2009.11.11
申请号 KR20097016607 申请日期 2008.02.22
申请人 PICODEON LTD OY 发明人 RUUTTU JARI;MYLLYMAEKI VESA;LAPPALAINEN REIJO;PULLI LASSE;MAEKITALO JUHA;YLAETALO SAMPO
分类号 C23C14/28;B23K26/02;H01J37/32 主分类号 C23C14/28
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