发明名称 Dry etching method for magnetic material
摘要 A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CH3OH), ethanol (C2H5OH) and propanol (C3H7OH).
申请公布号 USRE40951(E1) 申请公布日期 2009.11.10
申请号 US20080138280 申请日期 2008.06.12
申请人 CANON ANELVA CORPORATION 发明人 KODAIRA YOSHIMITSU;HIROMI TAICHI
分类号 C23F1/44;C23F4/00;G11C11/16;H01F41/30;H01L21/3065;H01L43/08;H01L43/12 主分类号 C23F1/44
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