| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scan exposure device and a scan exposure method, reducing the number of mask holding parts and irradiation parts and sharply reducing costs as compared with past exposure devices. <P>SOLUTION: In the scan exposure device 1, the substrate drive unit 17 of a substrate conveyance mechanism 10 is constituted movably so that a plurality of masks M and a substrates W may relatively move by a distance A in the Y direction, that is by approximately half of the inter-center distance D in the Y direction of mask patterns 51, 52 of the adjoining masks M. By conveying the substrate W on the return route after exposing first transfer patterns 53 separated respectively by a predetermined interval G and relatively moving the substrate conveyance mechanism 10 by a predetermined interval A during the return route conveyance of the substrate W, second transfer patterns 54 can be exposed on an unexposed part formed between the first transfer patterns 53 exposed during the return route conveyance without a gap. <P>COPYRIGHT: (C)2010,JPO&INPIT |
