| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source apparatus of a laser exciting plasma type for quickly discharging charged particles such as ions released from plasma to the outside of a chamber. <P>SOLUTION: The extreme ultraviolet light source apparatus includes the chamber in which extreme ultraviolet light is produced, a target supply means for supplying a target material to a predetermined position in the chamber, a driver laser for irradiating the target material supplied by the target supply means with laser beams to generate plasma, a condensing mirror for condensing the extreme ultraviolet light emitted from the plasma to output it, a field forming means using one coil to form an asymmetrical magnetic field at a position of generating the plasma, and a charged particle collecting mechanism arranged on at least one of two surfaces of the chamber to which magnetic field lines generated by the coil are directed. <P>COPYRIGHT: (C)2010,JPO&INPIT |
