发明名称 LIQUID CLEANING PROCESS AND LIQUID CLEANING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus capable of cleaning liquids such as polluted water more efficiently by using ozone and OH radicals. Ž<P>SOLUTION: The cleaning apparatus includes: a first region into which a raw material gas for cleaning is introduced to form ozone and OH radicals by generating a plasma from the raw material gas between opposing electrodes; and a second region through which the polluted liquid is passed and which includes a member provided with a photocatalyst at least in a part thereof and disposed in the flow path of the polluted liquid. The ozone and OH radicals formed are introduced into the second region, and the member provided with the photocatalyst is irradiated with the light arising from the plasma light emission. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009255081(A) 申请公布日期 2009.11.05
申请号 JP20090157800 申请日期 2009.07.02
申请人 FUJITSU LTD 发明人 HAYASHI YUJI;YANAGIDA HIROAKI;YAMAUCHI GORO;IRIE KANJI
分类号 C02F1/72;B01J19/08;C02F1/30 主分类号 C02F1/72
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