| 摘要 |
<p>A surface examining device includes a wafer holding unit (20) for holding a wafer (10), an examining light source (31, 32) for producing and shining linearly polarized examining light, and a light-receiving unit (33, 34) for detecting reflected light from an examination part on the surface of the wafer (10) when the examining light from the examining light source is directed to the examination part. The examining light source is so disposed that the examining light from the examining light source strikes the surface of the examination part at the Brewster's angle to the surface. The light-receiving unit (33, 34) is so disposed in the position as to receive reflected and scattered light from the examination part and not to receive the examining light regularly reflected from the surface of the examination part. The examination part is examined for defect detection by using the reflected and scattered light received by the light-receiving unit.</p> |
