发明名称 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
摘要 A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
申请公布号 US2009272916(A1) 申请公布日期 2009.11.05
申请号 US20090431367 申请日期 2009.04.28
申请人 ASML NETHERLANDS B.V. 发明人 SOER WOUTER ANTHON;VAN HERPEN MAARTEN MARINUS JOHANNES;JAK MARTIN JACOBUS JOHAN
分类号 G21K5/00;H05G2/00 主分类号 G21K5/00
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