| 摘要 |
The present invention provides metal-containing compounds that include at least one beta-diketiminate ligand, and methods of making and using the same. In some embodiments, the metal-containing compounds are homoleptic complexes that include unsymmetrical beta-diketiminate ligands. In other embodiments, the metal-containing compounds are heteroleptic complexes including at least one beta-diketiminate ligand. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for beta-diketiminate ligands are also provided.
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