| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate exposure device, capable of adjusting a load for each contact part, in correcting the deflection of a photomask and improving the load distribution and reducing the variations in in-plane exposure gap, thereby reducing the variations in line thickness and the film thickness of a CF pixel. <P>SOLUTION: In the substrate exposure device, a pattern is formed with a predetermined microgap, provided between a photomask and a glass substrate. As a mask deflection correcting mechanism, a mask holder for holding both two sides and two deflection correcting bars for pressurizing the edges on both sides of the mask from above are provided. The deflection correcting bar consists of a support post part and a plurality of cylindrical load parts arranged therearound. The outer peripheral surface of the support post part is threaded as a male screw, and the inner peripheral surface of the load part is threaded as a female screw. By rotating a weighting part, the position of the load part is arbitrarily adjusted. A plurality of kinds of load parts with different outside diameters are prepared, to allow an arbitrary diameter to be selected for each load point. <P>COPYRIGHT: (C)2010,JPO&INPIT |
