发明名称 Laser irradiation method, laser irradiation apparatus and method for manufacturing crystalline semiconductor film
摘要 A laser irradiation apparatus comprising: a first combined cylindrical lens array in which convex cylindrical lenses and concave cylindrical lenses are arranged alternately in a direction of curvature; and a second combined cylindrical lens array in which convex cylindrical lenses and concave cylindrical lenses are arranged alternately in a direction of curvature, wherein the first combined cylindrical lens array and the second combined cylindrical lens array are in contact with each other.
申请公布号 EP2113805(A1) 申请公布日期 2009.11.04
申请号 EP20090010674 申请日期 2005.04.21
申请人 SEMICONDUCTOR ENERGY LABORATORY CO, LTD. 发明人 TANAKA, KOICHIRO;OISHI, HIROTADA
分类号 B23K15/00;H01L21/20;B23K15/10;B23K26/073;G02B27/09;H01L21/336;H01L29/786 主分类号 B23K15/00
代理机构 代理人
主权项
地址