发明名称 |
Laser irradiation method, laser irradiation apparatus and method for manufacturing crystalline semiconductor film |
摘要 |
A laser irradiation apparatus comprising: a first combined cylindrical lens array in which convex cylindrical lenses and concave cylindrical lenses are arranged alternately in a direction of curvature; and a second combined cylindrical lens array in which convex cylindrical lenses and concave cylindrical lenses are arranged alternately in a direction of curvature, wherein the first combined cylindrical lens array and the second combined cylindrical lens array are in contact with each other. |
申请公布号 |
EP2113805(A1) |
申请公布日期 |
2009.11.04 |
申请号 |
EP20090010674 |
申请日期 |
2005.04.21 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO, LTD. |
发明人 |
TANAKA, KOICHIRO;OISHI, HIROTADA |
分类号 |
B23K15/00;H01L21/20;B23K15/10;B23K26/073;G02B27/09;H01L21/336;H01L29/786 |
主分类号 |
B23K15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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