CALIBRATION METHOD FOR EXPOSURE DEVICE, EXPOSURE METHOD FOR PHOTORESIST LAYER USING THE SAME AND EXPOSURE DEVICE FOR PERFORMING THE EXPOSURE METHOD

摘要

PURPOSE: A calibration method for exposure device, exposure method for photoresist layer using the same and exposure device for performing the exposure method are provided to expose easily the photosensitive film on the processed substrate of the large size. CONSTITUTION: The reference mask array is formed by arranging serially the reference mask in the first direction(S10). The origin is given to the first center(S31) by transferring the first reference mark formed in the first reference masks to the first center of the first microscopes. The second center point coordinate is given to the second center(S33) by transferring the standard mark to the second centers of the first microscopes and the second neighboring microscopes. The first reference marks of the second reference masks are transferred to the second center(S35). The third center point coordinate is given to the third center(S37) by transferring the standard mark of the second reference masks to the third center. The beam coordinate is given to exposing point(S50) by a reference frame.