METHOD OF MANUFACTURING HIGH VOLTAGE SEMICONDUCTOR,申请号KR20070139642-传众专利搜索

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发明名称	METHOD OF MANUFACTURING HIGH VOLTAGE SEMICONDUCTOR
摘要
申请公布号	KR100924859(B1)	申请公布日期	2009.11.02
申请号	KR20070139642	申请日期	2007.12.28
申请人		发明人
分类号	H01L29/78	主分类号	H01L29/78
代理机构		代理人
主权项
地址

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