| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a size measuring method and a size measuring device capable of outputting a stable measured value irrespective of a shift in lighting intensity distribution, and capable of reducing time and effort required so far for adjusting the position of the bright point of a light source. <P>SOLUTION: In this method, an image of an arbitrary pattern formed on a semiconductor exposing mask 17 is acquired with a microscope 11, and from the acquired image the size of the pattern is measured. A lighting intensity distribution of the microscope is acquired, the flattest position in the acquired lighting intensity distribution is determined as a position to be used for measurement, the arbitrary pattern is moved to the position to be used for the measurement to acquire its image, and from the acquired image the size of the pattern is measured. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
