发明名称 METHOD FOR FABRICATING MICROLENSES AND PROCESS OF SINGLE PHOTOMASK PATTERN-BASED PHOTOLITHOGRAPHY
摘要 A method for fabricating micro-lenses and a method for fabricating micro-lenses by photolithography are provided. The method includes forming a plurality of micro-cavities in a substrate, filling lens material into each of the micro-cavities, and heating the lens material, thereby reflowing the lens material so as to form a plurality of micro-lenses in the substrate. The micro-cavities define a boundary of each of the micro-lenses formed by reflowing the lens material, thereby preventing adjacent micro-lenses from fusing together by reflowing when overheated. The process uses negative photoresist and positive photoresist as micro-cavities and lens material respectively, thereby streamlining the fabrication method and its steps.
申请公布号 US2009267249(A1) 申请公布日期 2009.10.29
申请号 US20090356459 申请日期 2009.01.20
申请人 NATIONAL TAIWAN UNIVERSITY 发明人 SU GUO-DUNG;HSIEH HSIN-TA
分类号 B29D11/00;G03F7/20 主分类号 B29D11/00
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