发明名称 PLASMA DISCHARGE TREATMENT APPARATUS, AND THIN FILM DEPOSITION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma discharge treatment apparatus using roll-shaped rotary electrodes where, in film deposition, the variation of film thickness caused by the rotational accuracy of the roll rotary electrodes is made the minimum. <P>SOLUTION: When, using a plasma discharge treatment apparatus 1 comprising: a discharge space 100 where voltage is applied to a space between electrodes confronted with rotating roll electrodes 10A 10B, so as to generate plasma discharge; a base material F carried and passed through the discharge space 100; and a treatment gas feeding means 30 feeding a treatment gas G' to the discharge space, the surface of the carried and passed base material is repeatedly subjected to film deposition for at least two or more times (two or more passes), so as to cause lamination into a layer shape, the carrying of the base material is temporarily stopped, and the roll electrodes are rotated by prescribed quantity, so as to shift the relative positions of the base material and the roll electrodes. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009249738(A) 申请公布日期 2009.10.29
申请号 JP20080103441 申请日期 2008.04.11
申请人 KONICA MINOLTA HOLDINGS INC 发明人 SUZUKI MASANOBU
分类号 C23C16/54;C23C16/455;C23C16/505;C23C16/52;H05H1/24 主分类号 C23C16/54
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