| 摘要 |
PROBLEM TO BE SOLVED: To maintain suction of wafer on a rotation plate by controlling suction and exhaust under vacuum pressure. SOLUTION: The measuring device comprises a stage body 10 consisting of a circular fixed housing 11; a suction plate 14 placed rotatably inside the fixed housing 11 to form a suction pathway 13 at its center portion and jointed to a vacuum port 16 at bottom to rotate by an outer rotating force, and a step motor 17, placed at bottom of the fixed housing 11 to drive the suction plate 14 and connected to the suction plate 14; a base plate 20 supported by columns 22 forming a lower space of the fixed housing 11 of the stage body 10; a cylinder 24, coupled to a cylinder rod at the bottom where the base plate 20 moves up and down; and tools 30 supporting the wafer at outside of the stage body 10. COPYRIGHT: (C)2010,JPO&INPIT |
