发明名称 OPTICAL SYSTEM, EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a higher-performance optical system which reduces the restrictions on a layout structure of the optical system. <P>SOLUTION: In an optical system that includes an aperture diaphragm specifying light flux, a first portion, that is a part of an opening shape of the aperture diaphragm, includes a plurality of first stick-like members. The lengthwise direction of the plurality of stick-like members is parallel to a predetermined first direction and is specified by a first variable light-shielding member which is placed in proximity, in the widthwise direction. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009253048(A) 申请公布日期 2009.10.29
申请号 JP20080099639 申请日期 2008.04.07
申请人 NIKON CORP 发明人 SHIRAISHI MASAYUKI;MURAKAMI KATSUHIKO
分类号 H01L21/027;G02B17/08;G03F7/20 主分类号 H01L21/027
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