| 发明名称 |
POLYORGANOSILOXANE, RESIN COMPOSITION, AND PATTERNING PROCESS |
| 摘要 |
A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C-O-C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.
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| 申请公布号 |
US2009269697(A1) |
申请公布日期 |
2009.10.29 |
| 申请号 |
US20090429282 |
申请日期 |
2009.04.24 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KATO HIDETO;FURIHATA TOMOYOSHI;FURUYA MASAHIRO;HIRANO YOSHINORI |
| 分类号 |
G03F7/20;C08G77/04;G03F7/004 |
主分类号 |
G03F7/20 |
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