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发明名称
PLASMA PROCESSING SYSTEM AND METHOD AND ELECTRODE PLATE OF PLASMA PROCESSING SYSTEM
摘要
申请公布号
EP1569268(A4)
申请公布日期
2009.10.28
申请号
EP20030774215
申请日期
2003.11.25
申请人
TOKYO ELECTRON LIMITED
发明人
KOSHIISHI, AKIRA;HIROSE, JUN;OGASAWARA, M.;HIRANO, TAICHI;SASAKI, HIROMITSU;YOSHIDA, TETSUO;SAITO, MICHISHIGE;ISHIHARA, HIROYUKI;OOYABU, JUN;NUMATA, KOHJI
分类号
H01L21/3065;H05H1/46;B01J3/00;B01J19/08;C23F1/00;H01J37/32;H01L21/304;H01L21/306
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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