发明名称 |
Substrate processing apparatus and method |
摘要 |
In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported horizontally by the plurality of supports 7, with a predetermined distance ensured from the spin base 5 which opposes the bottom surface of the substrate W. Into the space which is created between the top surface of the substrate W and an opposing surface 9a of an atmosphere blocker plate 9, inert gas is ejected from a plurality of gas ejection outlets 9b which are formed in the opposing surface 9a. The inert gas thus supplied to the top surface of the substrate W presses the substrate W against the supports 7 and the substrate W is held at the spin base 5.
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申请公布号 |
US7608152(B2) |
申请公布日期 |
2009.10.27 |
申请号 |
US20050130585 |
申请日期 |
2005.05.17 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
MIYA KATSUHIKO;ANDO KOJI |
分类号 |
B08B3/02;B05D3/12;B08B11/02;G11B7/26;H01L21/00;H01L21/687 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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